Selection of the most suitable nodes on a network to execute a parallel application requires matching the network status to the application requirements. We propose and validate a...
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Abstract. Since the seminal book by the Gang of Four, design patterns have proven an important tool in software development. Over time, more and more patterns have been discovered ...
The detection of new information in a document stream is an important component of many potential applications. In this paper, a new novelty detection approach based on the identi...
Service composition is becoming the dominant paradigm for developing Web service applications. It is important to ensure that a service composition complies with the requirements f...
Jian Yu, Tan Phan Manh, Jun Han, Yan Jin, Yanbo Ha...