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TCAD
2010
13 years 2 months ago
2010
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
CVPR
2010
IEEE
14 years 4 days ago
2010
IEEE
The design of feature spaces for local image descriptors is an important research subject in computer vision due to its applicability in several problems, such as visual classifi...
ICDE
2010
IEEE
14 years 7 months ago
2010
IEEE
Scientific workflows are increasingly used for rapid integration of existing algorithms to form larger and more comgrams. Such workflows promise to provide more abstract, yet execu...
ECCV
2004
Springer
14 years 9 months ago
2004
Springer
A linear, discriminative, supervised technique for reducing feature vectors extracted from image data to a lower-dimensional representation is proposed. It is derived from classica...
TII
2010
13 years 2 months ago
2010
With growing cost of electricity, the power management of server clusters has become an important problem. However, most previous researchers only address the challenge in homogen...