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DAC
2009
ACM
14 years 12 months ago
Double patterning lithography friendly detailed routing with redundant via consideration
In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
Kun Yuan, Katrina Lu, David Z. Pan
GLVLSI
2006
IEEE
113views VLSI» more  GLVLSI 2006»
14 years 5 months ago
Statistical gate delay calculation with crosstalk alignment consideration
We study gate delay variation caused by crosstalk aggressor alignment, i.e., difference of signal arrival times in coupled neighboring interconnects. This effect is as significan...
Andrew B. Kahng, Bao Liu, Xu Xu
EUROPAR
2005
Springer
14 years 4 months ago
Integrating Mobile Devices into the Grid: Design Considerations and Evaluation
Mobile devices increasingly offer functionality beyond the one provided by traditional resources – processor, memory and applications. This includes, for example, integrated mul...
Stavros Isaiadis, Vladimir Getov
ICSOC
2003
Springer
14 years 4 months ago
Service-Based Distributed Querying on the Grid
Service-based approaches (such as Web Services and the Open Grid Services Architecture) have gained considerable attention recently for supporting distributed application developme...
M. Nedim Alpdemir, Arijit Mukherjee, Norman W. Pat...