In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
We study gate delay variation caused by crosstalk aggressor alignment, i.e., difference of signal arrival times in coupled neighboring interconnects. This effect is as significan...
Mobile devices increasingly offer functionality beyond the one provided by traditional resources – processor, memory and applications. This includes, for example, integrated mul...
Service-based approaches (such as Web Services and the Open Grid Services Architecture) have gained considerable attention recently for supporting distributed application developme...
M. Nedim Alpdemir, Arijit Mukherjee, Norman W. Pat...