—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
This paper describes a system to support humanities scholars in their interpretation of literary work. It presents a user interface and web architecture that integrates text minin...
Catherine Plaisant, James Rose, Bei Yu, Loretta Au...
The disparity between microprocessor clock frequencies and memory latency is a primary reason why many demanding applications run well below peak achievable performance. Software c...
Joseph Gebis, Leonid Oliker, John Shalf, Samuel Wi...
—All sciences, including astronomy, are now entering the era of information abundance. The exponentially increasing volume and complexity of modern data sets promises to transfor...
For a number of years, dataflow concepts have provided designers of digital signal processing systems with environments capable of expressing high-level software architectures as ...
William Plishker, Nimish Sane, Shuvra S. Bhattacha...