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TCAD
2010
194views more  TCAD 2010»
14 years 10 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
ISHPC
2003
Springer
15 years 8 months ago
Chordal Topologies for Interconnection Networks
Abstract. The class of dense circulant graphs of degree four with optimal distance-related properties is analyzed in this paper. An algebraic study of this class is done. Two geome...
Ramón Beivide, Carmen Martínez, Cruz...
GD
2005
Springer
15 years 8 months ago
Non-planar Core Reduction of Graphs
We present a reduction method that reduces a graph to a smaller core graph which behaves invariant with respect to planarity measures like crossing number, skewness, and thickness....
Carsten Gutwenger, Markus Chimani
ICALP
2003
Springer
15 years 8 months ago
Generating Labeled Planar Graphs Uniformly at Random
Abstract. We present an expected polynomial time algorithm to generate a labeled planar graph uniformly at random. To generate the planar graphs, we derive recurrence formulas that...
Manuel Bodirsky, Clemens Gröpl, Mihyun Kang
WG
2001
Springer
15 years 7 months ago
Approximation of Pathwidth of Outerplanar Graphs
There exists a polynomial time algorithm to compute the pathwidth of outerplanar graphs [3], but the large exponent makes this algorithm impractical. In this paper, we give an alg...
Fedor V. Fomin, Hans L. Bodlaender