Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Abstract. The class of dense circulant graphs of degree four with optimal distance-related properties is analyzed in this paper. An algebraic study of this class is done. Two geome...
We present a reduction method that reduces a graph to a smaller core graph which behaves invariant with respect to planarity measures like crossing number, skewness, and thickness....
Abstract. We present an expected polynomial time algorithm to generate a labeled planar graph uniformly at random. To generate the planar graphs, we derive recurrence formulas that...
There exists a polynomial time algorithm to compute the pathwidth of outerplanar graphs [3], but the large exponent makes this algorithm impractical. In this paper, we give an alg...