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TCAD
2010
194views more  TCAD 2010»
13 years 2 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
ISHPC
2003
Springer
14 years 26 days ago
Chordal Topologies for Interconnection Networks
Abstract. The class of dense circulant graphs of degree four with optimal distance-related properties is analyzed in this paper. An algebraic study of this class is done. Two geome...
Ramón Beivide, Carmen Martínez, Cruz...
GD
2005
Springer
14 years 1 months ago
Non-planar Core Reduction of Graphs
We present a reduction method that reduces a graph to a smaller core graph which behaves invariant with respect to planarity measures like crossing number, skewness, and thickness....
Carsten Gutwenger, Markus Chimani
ICALP
2003
Springer
14 years 27 days ago
Generating Labeled Planar Graphs Uniformly at Random
Abstract. We present an expected polynomial time algorithm to generate a labeled planar graph uniformly at random. To generate the planar graphs, we derive recurrence formulas that...
Manuel Bodirsky, Clemens Gröpl, Mihyun Kang
WG
2001
Springer
14 years 3 days ago
Approximation of Pathwidth of Outerplanar Graphs
There exists a polynomial time algorithm to compute the pathwidth of outerplanar graphs [3], but the large exponent makes this algorithm impractical. In this paper, we give an alg...
Fedor V. Fomin, Hans L. Bodlaender