—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
—In this paper, we propose a low-complexity scheme for minimizing energy consumption in a clustered multirate CDMA sensor network with multiple receive antennas by jointly contro...
We consider the randomized decision tree complexity of the recursive 3-majority function. For evaluating a height h formulae, we prove a lower bound for the -two-sided-error rando...
The dramatically increasing size of polygonal models resulting from 3D scanning devices and advanced modeling techniques requires new approaches to reduce the load of geometry tran...
List scheduling algorithms attempt to minimize latency under resource constraints using a priority list. We propose a new heuristic that can be used in conjunction with any priori...