Evolutionary computation methods have been used to solve several optimization and learning problems. This paper describes an application of evolutionary computation methods to con...
Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...
This paper describes how to reduce the burden of parallel programming by utilizing relevant parallel programs. Parallel algorithms are divided into four classes and a case base fo...
In program analysis and verification, there are some constraints that have to be processed repeatedly. A possible way to speed up the processing is to find some relations among the...
Background: Linear motifs (LMs) are abundant short regulatory sites used for modulating the functions of many eukaryotic proteins. They play important roles in post-translational ...