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116
Voted
DAC
2009
ACM
16 years 4 months ago
2009
ACM
Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
146
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SSDBM
2010
IEEE
15 years 1 months ago
2010
IEEE
Skyline queries have attracted considerable attention over the last few years, mainly due to their ability to return interesting objects without the need for user-defined scoring f...
150
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ICDM
2009
IEEE
15 years 1 months ago
2009
IEEE
The recent proliferation of graph data in a wide spectrum of applications has led to an increasing demand for advanced data analysis techniques. In view of this, many graph mining ...
128
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SPAA
2005
ACM
15 years 9 months ago
2005
ACM
One approach in verifying the correctness of a multiprocessor system is to show that its execution results comply with the memory consistency model it is meant to implement. It ha...
ICCD
2004
IEEE
16 years 22 days ago
2004
IEEE
Redundant rows and columns have been used for years to improve the yield of DRAM fabrication. However, finding a memory repair solution has been proved to be an NP-complete proble...