Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...
Abstract. It has been shown that many kernel methods can be equivalently formulated as minimal-enclosing-ball (MEB) problems in certain feature space. Exploiting this reduction eff...
Emanuele Frandi, Maria Grazia Gasparo, Stefano Lod...
Markov Random Fields (MRF's) can be used for a wide variety of vision problems. In this paper we focus on MRF's with two-valued clique potentials, which form a generaliz...
Abstract. In the present work, we are interested in the practical behavior of a new fptas to solve the approximation version of the 0-1 multiobjective knapsack problem. Nevertheles...
Cristina Bazgan, Hadrien Hugot, Daniel Vanderpoote...
Abstract— This paper presents a new efficient multiobjective evolutionary algorithm for solving computationallyintensive optimization problems. To support a high degree of parall...
Anna Syberfeldt, Henrik Grimm, Amos Ng, Robert Ivo...