Abstract. Industry is increasingly demanding IT support for large engineering processes, i.e., process structures consisting of hundreds up to thousands of processes. Developing a ...
Approach Abstracts AltPSM Lithography Requirements for sub-100nm IC Design Domains Pradiptya Ghosh, Chung-shin Kang, Michael Sanie and David Pinto Numerical Technologies, 70 West P...
Pradiptya Ghosh, Chung-shin Kang, Michael Sanie, D...
An experimental study shows the feasibility of service-oriented architectures for industrial automation and control systems even with respect to lower, real-time dependent control...
Andre Pohl, Heiko Krumm, Felix Holland, Franz-Jose...
A number of industry trends are shaping the requirements for IC and electronic equipment design. The density and complexity of circuit technologies have increased to a point where...
— Virtual assembly environment (VAE) technology has the great potential for benefiting the manufacturing applications in industry. Usability is an important aspect of the VAE. T...