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» Function Materialization in Object Bases
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SIGMOD
2009
ACM
175views Database» more  SIGMOD 2009»
14 years 11 months ago
QoX-driven ETL design: reducing the cost of ETL consulting engagements
As business intelligence becomes increasingly essential for organizations and as it evolves from strategic to operational, the complexity of Extract-Transform-Load (ETL) processes...
Alkis Simitsis, Kevin Wilkinson, Malú Caste...
SIGMOD
2008
ACM
191views Database» more  SIGMOD 2008»
14 years 11 months ago
Efficient aggregation for graph summarization
Graphs are widely used to model real world objects and their relationships, and large graph datasets are common in many application domains. To understand the underlying character...
Yuanyuan Tian, Richard A. Hankins, Jignesh M. Pate...

Publication
353views
14 years 9 months ago
Shape from Shading with Perspective Projection
Most conventional SFS (shape from shading) algorithms have been developed under the assumption of orthographic projection. However, the assumption is not valid when an object is no...
Kyoung Mu Lee (Seoul National University), C.-C. J...
ICCAD
2006
IEEE
127views Hardware» more  ICCAD 2006»
14 years 7 months ago
Platform-based resource binding using a distributed register-file microarchitecture
Behavior synthesis and optimization beyond the register transfer level require an efficient utilization of the underlying platform features. This paper presents a platform-based ...
Jason Cong, Yiping Fan, Wei Jiang
ICCAD
2006
IEEE
122views Hardware» more  ICCAD 2006»
14 years 7 months ago
Fill for shallow trench isolation CMP
Shallow trench isolation (STI) is the mainstream CMOS isolation technology. It uses chemical mechanical planarization (CMP) to remove excess of deposited oxide and attain a planar...
Andrew B. Kahng, Puneet Sharma, Alexander Zelikovs...