Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...
Temporal dependence within the workload of any computing or networking system has been widely recognized as a significant factor affecting performance. More specifically, burstin...
Evgenia Smirni, Qi Zhang, Ningfang Mi, Alma Riska,...
The computational identification of genes in DNA sequences has become an issue of crucial importance due to the large number of DNA molecules being currently sequenced. We present ...
In a desktop grid model, the job (computational task) is submitted for execution in the resource only when the resource is idle. There is no guarantee that the job which has starte...
Software artifacts usually have static program constraints and these constraints should be satisfied in each reuse. In addition to this, the developers are also required to satisf...