In this paper, we propose a second order optimization method to learn models where both the dimensionality of the parameter space and the number of training samples is high. In ou...
Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...
This paper proposes a real-time method to compute multiple scattering in non-homogeneous participating media having general phase functions. The volume represented by a particle s...
The availability of large-scale computing platforms comprised of tens of thousands of multicore processors motivates the need for the next generation of highly scalable sparse line...
Implicit surfaces are used for a number of tasks in computer graphics, including modeling soft or organic objects, morphing, collision detection, and constructive solid geometry. A...