Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Corner detection plays an important role in object recognition and motion analysis. In this paper, we propose a hierarchical corner detection framework based on spectral clusterin...
In this article we present an automatic on-line color calibration system that makes extensive use of the spatial relationships between color classes in the color space. First, we i...
Pablo Guerrero, Javier Ruiz-del-Solar, Josué...
Plaque analysis in IVUS planes needs accurate intima and adventitia models. Large variety in adventitia descriptors difficulties its detection and motivates using a classification...
Debora Gil, Aura Hernandez, Antoni Carol, Oriol Ro...
A support vector machine based algorithm for corner detection is presented. It is based on computing the direction of maximum gray-level change for each edge pixel in an image, an...