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TCAD
2010
194views more  TCAD 2010»
13 years 2 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
ICIP
2007
IEEE
14 years 1 months ago
Corner Detection of Contour Images using Spectral Clustering
Corner detection plays an important role in object recognition and motion analysis. In this paper, we propose a hierarchical corner detection framework based on spectral clusterin...
Xi Li, Weiming Hu, Zhongfei Zhang
ROBOCUP
2007
Springer
102views Robotics» more  ROBOCUP 2007»
14 years 1 months ago
Automatic On-Line Color Calibration Using Class-Relative Color Spaces
In this article we present an automatic on-line color calibration system that makes extensive use of the spatial relationships between color classes in the color space. First, we i...
Pablo Guerrero, Javier Ruiz-del-Solar, Josué...
FIMH
2005
Springer
14 years 1 months ago
A Deterministic-Statistic Adventitia Detection in IVUS Images
Plaque analysis in IVUS planes needs accurate intima and adventitia models. Large variety in adventitia descriptors difficulties its detection and motivates using a classification...
Debora Gil, Aura Hernandez, Antoni Carol, Oriol Ro...
ICPR
2004
IEEE
14 years 8 months ago
Corner Detection Using Support Vector Machines
A support vector machine based algorithm for corner detection is presented. It is based on computing the direction of maximum gray-level change for each edge pixel in an image, an...
Malay K. Kundu, Minakshi Banerjee, Pabitra Mitra