This paper describes a new collaboration technology that is based on the support of lightweight, informally structured, opportunistic activities featuring heterogeneous threads of...
David R. Millen, Michael J. Muller, Werner Geyer, ...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Multi-modality is a fundamental feature that characterizes biological systems and lets them achieve high robustness in understanding skills while coping with uncertainty. Relativel...
Nicoletta Noceti, Barbara Caputo, Claudio Castelli...
In this paper, we investigate the multimodal nature of cell phone data in terms of discovering recurrent and rich patterns in people’s lives. We present a method that can discov...
This paper presents a systematic approach to mine colocation patterns in Sloan Digital Sky Survey (SDSS) data. SDSS Data Release 5 (DR5) contains 3.6 TB of data. Availability of s...