Process variations due to lens aberrations are to a large extent systematic, and can be modeled for purposes of analyses and optimizations in the design phase. Traditionally, vari...
Andrew B. Kahng, Chul-Hong Park, Puneet Sharma, Qi...
In this paper, we propose the first wire density driven global routing that considers CMP variation and timing. To enable CMP awareness during global routing, we propose a compac...
We present a novel detailed placement technique that accounts for systematic through-pitch variations to reduce leakage. Leakage depends nearly exponentially on linewidth (gate le...
Abstract— Double patterning lithography (DPL) is in current production for memory products, and is widely viewed as inevitable for logic products at the 32nm node. DPL decomposes...
Abstract. Bitmap indices are popular multi-dimensional data structures for accessing read-mostly data such as data warehouse (DW) applications, decision support systems (DSS) and o...