Abstract-- The operational characteristics of integrated circuits based on nanoscale semiconductor technology are expected to be increasingly affected by variations in the manufact...
Abstract: As a result of variations in the fabrication process, different memory components are produced with different operational characteristics, a situation that complicates th...
Current lithography techniques use a light wavelength of 193nm to print sub-65nm features. This introduces process variations which cause mismatches between desired and actual waf...
Near-threshold operation has emerged as a competitive approach for energy-efficient architecture design. In particular, a combination of near-threshold circuit techniques and par...
Sangwon Seo, Ronald G. Dreslinski, Mark Woh, Yongj...
— Designers require variational information for robust designs. Characterization of such information can be costly for the novel nanoparticle interconnect process, which utilize ...