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WSC
2000
14 years 7 days ago
2000
STRACTION FOR DISCRETE EVENT SYSTEMS USING NEURAL NETWORKS AND SENSITIVITY INFORMATION Christos G. Panayiotou Christos G. Cassandras Department of Manufacturing Engineering Boston ...
ICEIS
1999
IEEE
14 years 3 months ago
1999
IEEE
: Manufacturing systems are changing its structure and organisation. Supply chain are evolving to more coupled organisations, like virtual enterprises, though maintaining the singl...
WSC
2008
14 years 1 months ago
2008
Scheduling is one of the key factors for semiconductor fabrication productivity. Objectives like lot cycle time and throughput must be optimized to push the technological developm...
WSC
2008
14 years 1 months ago
2008
Semiconductor fabs often offer manufacturing service of multiple priorities in terms of cycle time-based X-factor targets (XFTs) and fab production must be planned accordingly. Th...
DAC
2000
ACM
14 years 3 months ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...