Abstract. We study computationally hard combinatorial problems arising from the important engineering question of how to maximize the number of connections that can be simultaneous...
Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...
With the advent of high-performance COTS clusters, there is a need for a simple, scalable and faulttolerant parallel programming and execution paradigm. In this paper, we show that...
Reza Farivar, Abhishek Verma, Ellick Chan, Roy H. ...
We study the problem of covering a set of points or polyhedra in 3 with two axis-aligned boxes in order to minimize a function of the measures of the two boxes, such as the sum or...
Esther M. Arkin, Gill Barequet, Joseph S. B. Mitch...
This paper presents an approach for combined mass and energy integration in process synthesis and illustrates it at the thermochemical production of crude synthetic natural gas (S...