Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
In real world, a scene is composed by many characteristics. Intrinsic images represent these characteristics by two components, reflectance (the albedo of each point) and shading (...
For about twenty years the standard color sampling method for RGBA volume data has been the interpolation of opacity-weighted colors. In this work, we discuss the underlying appro...
Abstract. We explore the effects of using graph width metrics as restrictions on the input to online problems. It seems natural to suppose that, for graphs having some form of bou...
We cast some new insights into solving the digital matting
problem by treating it as a semi-supervised learning
task in machine learning. A local learning based approach
and a g...