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TCAD
2010
194views more  TCAD 2010»
13 years 2 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
ACCV
2009
Springer
14 years 2 months ago
Weighted Map for Reflectance and Shading Separation Using a Single Image
In real world, a scene is composed by many characteristics. Intrinsic images represent these characteristics by two components, reflectance (the albedo of each point) and shading (...
Sung-Hsien Hsieh, Chih-Wei Fang, Te-Hsun Wang, Chi...
VMV
2008
120views Visualization» more  VMV 2008»
13 years 8 months ago
Interpolating and Downsampling RGBA Volume Data
For about twenty years the standard color sampling method for RGBA volume data has been the interpolation of opacity-weighted colors. In this work, we discuss the underlying appro...
Martin Kraus, Kai Bürger
IWPEC
2004
Springer
14 years 22 days ago
Online Problems, Pathwidth, and Persistence
Abstract. We explore the effects of using graph width metrics as restrictions on the input to online problems. It seems natural to suppose that, for graphs having some form of bou...
Rodney G. Downey, Catherine McCartin
ICCV
2009
IEEE
1184views Computer Vision» more  ICCV 2009»
15 years 10 days ago
Learning Based Digital Matting
We cast some new insights into solving the digital matting problem by treating it as a semi-supervised learning task in machine learning. A local learning based approach and a g...
Yuanjie Zheng, Chandra Kambhamettu