Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Detecting objects in complex scenes while recovering the scene layout is a critical functionality in many vision-based applications. Inspired by the work of [18], we advocate the ...
Abstract. We show how duality properties and geometric considerations are used in studies related to virtual path layouts of ATM networks. We concentrate on the one-to-many problem...
In this paper we consider the problem of drawing and displaying a series of related graphs, i.e., graphs that share all, or parts of the same node set. We present three algorithms...
Cesim Erten, Stephen G. Kobourov, Vu Le, Armand Na...
As the ever-increasing gap between the speed of processor and the speed of memory has become the cause of one of primary bottlenecks of computer systems, modern architecture system...