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TCAD
2010
194views more  TCAD 2010»
13 years 2 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
CVPR
2010
IEEE
14 years 3 months ago
Toward Coherent Object Detection And Scene Layout Understanding
Detecting objects in complex scenes while recovering the scene layout is a critical functionality in many vision-based applications. Inspired by the work of [18], we advocate the ...
Yingze Bao, Min Sun, Silvio Savarese
MFCS
2000
Springer
13 years 11 months ago
On the Use of Duality and Geometry in Layouts for ATM Networks
Abstract. We show how duality properties and geometric considerations are used in studies related to virtual path layouts of ATM networks. We concentrate on the one-to-many problem...
Shmuel Zaks
GD
2003
Springer
14 years 23 days ago
Simultaneous Graph Drawing: Layout Algorithms and Visualization Schemes
In this paper we consider the problem of drawing and displaying a series of related graphs, i.e., graphs that share all, or parts of the same node set. We present three algorithms...
Cesim Erten, Stephen G. Kobourov, Vu Le, Armand Na...
EUC
2006
Springer
13 years 11 months ago
Data-Layout Optimization Using Reuse Distance Distribution
As the ever-increasing gap between the speed of processor and the speed of memory has become the cause of one of primary bottlenecks of computer systems, modern architecture system...
Xiong Fu, Yu Zhang, Yiyun Chen