Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
Abstract--This paper provides a high level survey of the increasing effects of on-chip inductance. These effects are classified into desirable and nondesirable effects. Among the u...
In virtual machine environments each application is often run in its own virtual machine (VM), isolating it from other applications running on the same physical machine. Contentio...
Justin Cappos, Scott M. Baker, Jeremy Plichta, Duy...
Light-weight, flexible access control, which allows software to regulate reads and writes to any granularity of memory region, can help improve the reliability of today’s multi...
Abstract. Recently, component-based application developments to improve the software productivity and reusability have attracted our attention. The components are parts for buildin...