This paper suggests the need for a software engineering research community conversation about the future that the community would like to have. The paper observes that the researc...
Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...
One of the main problems of requirements elicitation is expressing customer requirements in a form that can be understood not only by requirements engineers but also by noncomputer...
This paper presents an approach to the study of cognitive activities in collaborative software development. This approach has been developed by a multidisciplinary team made up of...
Pierre N. Robillard, Patrick d'Astous, Franç...
Automated tools for mediating incoming interruptions are necessary in order to balance the concentration required for software development with the need to collaborate and absorb ...