Phase shifting mask (PSM) is a promising resolution enhancement technique, which is used in the deep sub-wavelength lithography of the VLSI fabrication process. However, applying ...
Traditionally, clock network layout is performed after cell placement. Such methodology is facing a serious problem in nanometer IC designs where people tend to use huge clock buff...
—In this paper we describe a practical methodology to formally verify highly optimized, industrial multipliers. We a multiplier description language which abstracts from low-leve...
Udo Krautz, Markus Wedler, Wolfgang Kunz, Kai Webe...
ACT Benchmarks are an immensely useful tool in performing research since they allow for rapid and clear comparison between different approaches to solving CAD problems. Recent expe...
Meeting power and performance requirement is a challenging task in high speed ALUs. Supply voltage scaling is promising because it reduces both switching and active power but it al...