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DAC
2000
ACM
15 years 7 months ago
Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
Ruiqi Tian, D. F. Wong, Robert Boone
DAC
2000
ACM
16 years 4 months ago
Formal verification of iterative algorithms in microprocessors
Contemporary microprocessors implement many iterative algorithms. For example, the front-end of a microprocessor repeatedly fetches and decodes instructions while updating interna...
Mark Aagaard, Robert B. Jones, Roope Kaivola, Kath...
DAC
2000
ACM
16 years 4 months ago
Designing systems-on-chip using cores
Leading-edge systems-on-chip (SoC) being designed today could reach 20 Million gates and 0.5 to 1 GHz operating frequency. In order to implement such systems, designers are increa...
Reinaldo A. Bergamaschi, William R. Lee
122
Voted
DAC
2000
ACM
16 years 4 months ago
COSY communication IP's
The Esprit/OMI-COSY project defines transaction-levels to set-up the exchange of IP's in separating function from architecture and body-behavior from proprietary interfaces. ...
Erwin A. de Kock, Frédéric Pé...
98
Voted
DAC
2000
ACM
16 years 4 months ago
GTX: the MARCO GSRC technology extrapolation system
Technology extrapolation -- the calibration and prediction of achievable design in future technology generations ? drives the evolution of VLSI system architectures, design method...
Andrew E. Caldwell, Yu Cao, Andrew B. Kahng, Farin...