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DAC
2000
ACM
14 years 2 months ago
Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
Ruiqi Tian, D. F. Wong, Robert Boone
DAC
2000
ACM
14 years 10 months ago
Formal verification of iterative algorithms in microprocessors
Contemporary microprocessors implement many iterative algorithms. For example, the front-end of a microprocessor repeatedly fetches and decodes instructions while updating interna...
Mark Aagaard, Robert B. Jones, Roope Kaivola, Kath...
DAC
2000
ACM
14 years 10 months ago
Designing systems-on-chip using cores
Leading-edge systems-on-chip (SoC) being designed today could reach 20 Million gates and 0.5 to 1 GHz operating frequency. In order to implement such systems, designers are increa...
Reinaldo A. Bergamaschi, William R. Lee
DAC
2000
ACM
14 years 10 months ago
COSY communication IP's
The Esprit/OMI-COSY project defines transaction-levels to set-up the exchange of IP's in separating function from architecture and body-behavior from proprietary interfaces. ...
Erwin A. de Kock, Frédéric Pé...
DAC
2000
ACM
14 years 10 months ago
GTX: the MARCO GSRC technology extrapolation system
Technology extrapolation -- the calibration and prediction of achievable design in future technology generations ? drives the evolution of VLSI system architectures, design method...
Andrew E. Caldwell, Yu Cao, Andrew B. Kahng, Farin...