—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
Contemporary microprocessors implement many iterative algorithms. For example, the front-end of a microprocessor repeatedly fetches and decodes instructions while updating interna...
Mark Aagaard, Robert B. Jones, Roope Kaivola, Kath...
Leading-edge systems-on-chip (SoC) being designed today could reach 20 Million gates and 0.5 to 1 GHz operating frequency. In order to implement such systems, designers are increa...
The Esprit/OMI-COSY project defines transaction-levels to set-up the exchange of IP's in separating function from architecture and body-behavior from proprietary interfaces. ...
Technology extrapolation -- the calibration and prediction of achievable design in future technology generations ? drives the evolution of VLSI system architectures, design method...
Andrew E. Caldwell, Yu Cao, Andrew B. Kahng, Farin...