168 search results - page 4 / 34 » et 1998 |
DAC
2000
ACM
14 years 2 days ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
LATIN
1998
Springer
13 years 12 months ago
1998
Springer
The problem of approximate pattern matching on hypertext is de ned and solved by Amir et al. in O(m(nlogm + e)) time, where m is the length of the pattern, n is the total text size...
JELIA
2000
Springer
13 years 11 months ago
2000
Springer
Abstract. Among others, Alferes et al. (1998) presented an approach for updating logic programs with sets of rules based on dynamic logic programs. We syntactically redefine dynami...
VDB
1998
13 years 9 months ago
1998
Any graphical user interface (GUI) requires large amounts of complex metadata for the layout of windows and menus, their style and behavior, their bindings, etc. Designing, debugg...
STOC
1998
ACM
13 years 12 months ago
1998
ACM
We study integrated prefetching and caching problems following the work of Cao et. al. [3] and Kimbrel and Karlin [13]. Cao et. al. and Kimbrel and Karlin gave approximation algor...