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18
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ICCAD
2006
IEEE
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ICCAD 2006
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Variability and yield improvement: rules, models, and characterization
14 years 9 months ago
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www.cecs.uci.edu
Yield and variability are becoming detractors for successful design in sub-90-nm process technologies. We consider the fundamental lithography and process issues that are driving ...
Kenneth L. Shepard, Daniel N. Maynard
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