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ICCAD
2006
IEEE
99views Hardware» more  ICCAD 2006»
14 years 9 months ago
Variability and yield improvement: rules, models, and characterization
Yield and variability are becoming detractors for successful design in sub-90-nm process technologies. We consider the fundamental lithography and process issues that are driving ...
Kenneth L. Shepard, Daniel N. Maynard