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    ISQED
    2003
    IEEE
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    New DFM Approach Abstracts AltPSM Lithography Requirements for sub-100nm IC Design Domains
    14 years 4 months ago
    New DFM Approach Abstracts AltPSM Lithography Requirements for sub-100nm IC Design Domains
    Download  www.cecs.uci.edu
    Approach Abstracts AltPSM Lithography Requirements for sub-100nm IC Design Domains Pradiptya Ghosh, Chung-shin Kang, Michael Sanie and David Pinto Numerical Technologies, 70 West P...
    Pradiptya Ghosh, Chung-shin Kang, Michael Sanie, D...
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