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VLSID
2007
IEEE
131views VLSI» more  VLSID 2007»
14 years 12 months ago
Probabilistic Self-Adaptation of Nanoscale CMOS Circuits: Yield Maximization under Increased Intra-Die Variations
As technology scales to 40nm and beyond, intra-die process variability will cause large delay and leakage variations across a chip in addition to expected die-to-die variations. I...
Maryam Ashouei, Muhammad Mudassar Nisar, Abhijit C...