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ASPDAC
2001
ACM
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ASPDAC 2001
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New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout
14 years 3 months ago
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vlsicad.ucsd.edu
Abstract-- We describe new graph bipartization algorithms for layout modification and phase assignment of bright-field alternating phaseshifting masks (AltPSM) [25]. The problem of...
Andrew B. Kahng, Shailesh Vaya, Alexander Zelikovs...
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