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    ENGL
    2008
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    Two-stage Atomic Layer Deposition of Smooth Aluminum Oxide on Hydrophobic Self-assembled Monolayers
    13 years 11 months ago
    Two-stage Atomic Layer Deposition of Smooth Aluminum Oxide on Hydrophobic Self-assembled Monolayers
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    We describe the growth of aluminum oxide (AlOx) on strong hydrophobic surfaces that consist of CH3-terminated self-assembled monolayers (CH3-SAMs) by utilizing atomic layer deposit...
    Nobuhiko P. Kobayashi, R. Stanley Williams
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