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    2005
    ACM
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    Detailed placement for improved depth of focus and CD control
    14 years 9 months ago
    Detailed placement for improved depth of focus and CD control
    Download  vlsicad.ucsd.edu
    — Sub-resolution assist features (SRAFs) provide an absolutely essential technique for critical dimension (CD) control and process window enhancement in subwavelength lithography...
    Puneet Gupta, Andrew B. Kahng, Chul-Hong Park
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