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    CPHYSICS
    2007
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    Plasma etching and feature evolution of organic low-k material by using VicAddress
    13 years 11 months ago
    Plasma etching and feature evolution of organic low-k material by using VicAddress
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    Plasma process is a highly selective technique exploiting the individual or mixed function of positive ions, electrons, neutral radicals, and photons produced by low temperature p...
    T. Makabe, T. Shimada, T. Yagisawa
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