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    2009
    ACM
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    Double patterning lithography friendly detailed routing with redundant via consideration
    15 years 16 days ago
    Double patterning lithography friendly detailed routing with redundant via consideration
    Download  www.cerc.utexas.edu
    In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
    Kun Yuan, Katrina Lu, David Z. Pan
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