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33
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VLSID
2007
IEEE
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VLSI
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VLSID 2007
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Probabilistic Self-Adaptation of Nanoscale CMOS Circuits: Yield Maximization under Increased Intra-Die Variations
15 years 1 months ago
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www.gigascale.org
As technology scales to 40nm and beyond, intra-die process variability will cause large delay and leakage variations across a chip in addition to expected die-to-die variations. I...
Maryam Ashouei, Muhammad Mudassar Nisar, Abhijit C...
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