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    GLVLSI
    2006
    IEEE
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    Measurement and characterization of pattern dependent process variations of interconnect resistance, capacitance and inductance
    14 years 5 months ago
    Measurement and characterization of pattern dependent process variations of interconnect resistance, capacitance and inductance
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    Process variations have become a serious concern for nanometer technologies. The interconnect and device variations include interand intra-die variations of geometries, as well as...
    Xiaoning Qi, Alex Gyure, Yansheng Luo, Sam C. Lo, ...
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