High Q-factor CMOS-MEMS inductor

This study investigates a high Q-factor spiral inductor fabricated by the CMOS (complementary metal oxide semiconductor) process and a post-process. The spiral inductor is manufactured on silicon substrate using the 0.35

• Type: Journal
• Year: 2008
• Where: CORR
• Authors: Ching-Liang Dai, Jin-Yu Hong, Mao-Chen Liu
• Keywords: CORR 2008, Education, Q-factor Spiral Inductor, Silicon Substrate, Spiral Inductor