Dummy fill density analysis with coupling constraints

14 years 2 months ago

In modern VLSI manufacturing processes, dummy ﬁlls are widely used to adjust local metal density in order to improve layout unifor

Hua Xiang, Liang Deng, Ruchir Puri, Kai-Yuan Chao,

Hardware | ISPD 2007 | Local Metal Density | VLSI Manufacturing Processes |

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Added	26 Oct 2010
Updated	26 Oct 2010
Type	Conference
Year	2007
Where	ISPD
Authors	Hua Xiang, Liang Deng, Ruchir Puri, Kai-Yuan Chao, Martin D. F. Wong

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