Dummy fill density analysis with coupling constraints

14 years 29 days ago

In modern VLSI manufacturing processes, dummy ﬁlls are widely used to adjust local metal density in order to improve layout unifor

Hua Xiang, Liang Deng, Ruchir Puri, Kai-Yuan Chao,

Hardware | ISPD 2007 | Local Metal Density | VLSI Manufacturing Processes |

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Added	26 Oct 2010
Updated	26 Oct 2010
Type	Conference
Year	2007
Where	ISPD
Authors	Hua Xiang, Liang Deng, Ruchir Puri, Kai-Yuan Chao, Martin D. F. Wong

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