We have developed a multiple genome alignment algorithm by using a sequence clustering algorithm to combine local pairwise genome sequence matches produced by pairwise genome align...
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
This paper investigates an approach to model the space of brain images through a low-dimensional manifold. A data driven method to learn a manifold from a collections of brain imag...
Samuel Gerber, Tolga Tasdizen, Sarang C. Joshi, Ro...
We present a modular approach to implement adaptive decisions with existing scientific codes. Using a sophisticated system software tool based on the function call interception t...
Pilsung Kang 0002, Yang Cao, Naren Ramakrishnan, C...
Traditional schema matchers use a set of distinct simple matchers and use a composition function to combine the individual scores using an arbitrary order of matcher application l...