Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
In this paper, we set forth a new algorithm for generating approximately uniformly random spanning trees in undirected graphs. We show how to sample from a distribution that is wi...
The design of programmable logic architectures and supporting computer-aided design tools fundamentally requires both a good understanding of the combinatorial nature of netlist gr...
Michael D. Hutton, Jonathan Rose, Derek G. Corneil
In this paper, we present a general data clustering algorithm which is based on the asymmetric pairwise measure of Markov random walk hitting time on directed graphs. Unlike tradi...
We consider two generalizations of the edge coloring problem in bipartite graphs. The first problem we consider is the weighted bipartite edge coloring problem where we are given a...