ISPD 2010 - PDF Preprint Papers

ISPD 2010 International Symposium on Physical Design

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ISPD
2010
ACM

249views Hardware» more ISPD 2010»

A matching based decomposer for double patterning lithography

14 years 7 months ago

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Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...

Yue Xu, Chris Chu

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