Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
—A new parameter-free graph-morphology-based segmentation algorithm is proposed to address the problem of partitioning a 3D triangular mesh into disjoint submeshes that correspon...
Multi-FPGA systems (MFSs) are used as custom computing machines, logic emulators and rapid prototyping vehicles. A key aspect of these systems is their programmable routing archit...
We propose a novel patch-based image representation that is useful because it (1) inherently detects regions with repetitive structure at multiple scales and (2) yields a paramete...
Lena Gorelick, Andrew Delong, Olga Veksler, Yuri B...
The goal of graph clustering is to partition objects in a graph database into different clusters based on various criteria such as vertex connectivity, neighborhood similarity or t...