430 search results - page 14 / 86 » A New Linearizing Restriction in the Pattern Matching Proble... |
ISPD
2010
ACM
14 years 2 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
STOC
2003
ACM
14 years 8 months ago
2003
ACM
Given a database of n points in {0, 1}d, the partial match problem is: In response to a query x in {0, 1, }d, find a database point y such that for every i whenever xi = , we have...
SIAMSC
2010
13 years 6 months ago
2010
Abstract. A problem that arises in slice-selective magnetic resonance imaging (MRI) radiofrequency (RF) excitation pulse design is abstracted as a novel linear inverse problem with...
CDB
2004
Springer
14 years 1 months ago
2004
Springer
Abstract. Long DNA sequences have to be cut using restriction enzymes into small fragments whose lengths and/or nucleotide sequences can be analyzed by currently available technolo...
SODA
2000
ACM
13 years 9 months ago
2000
ACM
Real Scaled Matching is the problem of finding all locations in the text where the pattern, proportionally enlarged according to an arbitrary real-sized scale, appears. Real scale...