236 search results - page 19 / 48 » A New Neighborhood Based on Improvement Graph for Robust Gra... |
TCAD
2010
13 years 3 months ago
2010
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
PAMI
2007
13 years 8 months ago
2007
—A novel patch-based correspondence model is presented in this paper. Many segment-based correspondence approaches have been proposed in recent years. Untextured pixels and bound...
3DPVT
2006
IEEE
14 years 2 months ago
2006
IEEE
In this paper we propose a novel framework for efficiently extracting foreground objects in so called shortbaseline image sequences. We apply the obtained segmentation to improve...
GLOBECOM
2009
IEEE
14 years 3 months ago
2009
IEEE
Abstract—In this paper, we consider the problem of multifunctional compression with side information. The problem is how we can compress a source X so that the receiver is able t...
GD
1995
Springer
14 years 10 min ago
1995
Springer
We present a 3-D version of GEM [6], a randomized adaptive layout algorithm for nicely drawing undirected graphs, based on the spring-embedder paradigm [4]. The new version, GEM-3D...