Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
—A novel patch-based correspondence model is presented in this paper. Many segment-based correspondence approaches have been proposed in recent years. Untextured pixels and bound...
In this paper we propose a novel framework for efficiently extracting foreground objects in so called shortbaseline image sequences. We apply the obtained segmentation to improve...
Abstract—In this paper, we consider the problem of multifunctional compression with side information. The problem is how we can compress a source X so that the receiver is able t...
We present a 3-D version of GEM [6], a randomized adaptive layout algorithm for nicely drawing undirected graphs, based on the spring-embedder paradigm [4]. The new version, GEM-3D...