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DAC
2003
ACM
14 years 8 months ago
A cost-driven lithographic correction methodology based on off-the-shelf sizing tools
As minimum feature sizes continue to shrink, patterned features have become significantly smaller than the wavelength of light used in optical lithography. As a result, the requir...
Puneet Gupta, Andrew B. Kahng, Dennis Sylvester, J...
ICSE
2005
IEEE-ACM
14 years 7 months ago
Use of relative code churn measures to predict system defect density
Software systems evolve over time due to changes in requirements, optimization of code, fixes for security and reliability bugs etc. Code churn, which measures the changes made to...
Nachiappan Nagappan, Thomas Ball
MSWIM
2005
ACM
14 years 1 months ago
An analytical model of the virtual collision handler of 802.11e
A number of analytical models have been proposed to describe the priority schemes of the Enhanced Distributed Channel Access (EDCA) mechanism of the IEEE 802.11e standard. EDCA pr...
Paal E. Engelstad, Olav N. Østerbø