In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
In this work, we parameterize and explore the interconnect structure of pipelined FPGAs. Specifically, we explore the effects of interconnect register population, length of regist...
Akshay Sharma, Katherine Compton, Carl Ebeling, Sc...
With inherent problem complexity, ever increasing instance size and ever decreasing layout area, there is need in physical design for improved heuristics and algorithms. In this in...
In many networks, such as mobile ad-hoc networks and friend-to-friend overlay networks, direct communication between nodes is limited to specific neighbors. Often these networks ...
Nathan S. Evans, Chris GauthierDickey, Christian G...
We study vehicle routing problems with constraints on the distance traveled by each vehicle or on the number of vehicles. The objective is to minimize the total distance traveled b...