1727 search results - page 127 / 346 » An Integrated Approach to Manufacturing Process Design and C... |
140
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SLIP
2009
ACM
15 years 11 months ago
2009
ACM
Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
124
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ICIP
2003
IEEE
16 years 6 months ago
2003
IEEE
This paper details a new modular approach to virtual view creation that is designed to work in conjunction with a proposed scalable teleconferencing configuration. This scalable s...
154
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ASE
1999
15 years 4 months ago
1999
Behaviour analysis should form an integral part of the software development process. This is particularly important in the design of concurrent and distributed systems, where comp...
157
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DSN
2006
IEEE
15 years 10 months ago
2006
IEEE
The costs of data loss and unavailability can be large, so businesses use many data protection techniques, such as remote mirroring, snapshots and backups, to guard against failur...
151
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EDBT
2006
ACM
16 years 4 months ago
2006
ACM
In [12] we introduce a novel architecture for data processing, based on a functional fusion between a data and a computation layer. In this demo we show how this architecture is le...