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ISPD
2010
ACM
14 years 3 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
CVPR
2004
IEEE
14 years 11 months ago
2004
IEEE
Multibody grouping is a representative of applying subspace constraints in computer vision tasks. Under linear projection models, feature points of multibody reside in multiple su...
CEC
2010
IEEE
13 years 10 months ago
2010
IEEE
In this paper, we present a memetic algorithm with novel local optimizer hybridization strategy for constrained optimization. The developed MA consists of multiple cycles. In each ...
Publication
"This paper presents an efficient algorithm for solving one sort of region-based active contour models, i.e. the active contours without edges model. We develop the link betwe...
EC
2002
13 years 8 months ago
2002
Previous work on multiobjective genetic algorithms has been focused on preventing genetic drift and the issue of convergence has been given little attention. In this paper, we pre...