BACKGROUND: Defect predictors learned from static code measures can isolate code modules with a higher than usual probability of defects. AIMS: To improve those learners by focusi...
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Abstract--This paper presents a GALS-compatible circuitswitched on-chip network that is well suited for use in many-core platforms targeting streaming DSP and embedded applications...
Face verification in the presence of age progression is an important problem that has not been widely addressed. In this paper, we study the problem by designing and evaluating dis...
This paper addresses variational supervised texture segmentation. The main contributions are twofold. First, the proposed method circumvents a major problem related to classical t...