Affect sensitivity is of the utmost importance for a robot companion to be able to display socially intelligent behaviour, a key requirement for sustaining long-term interactions ...
In situ staining of a target mRNA at several time points during the development of a D. melanogaster embryo gives one a detailed spatio-temporal view of the expression pattern of ...
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
As mobile devices, such as laptops, PDAs or mobile phones, are getting more and more ubiquitous and are able to communicate with each other via wireless technologies, the paradigm...
In this paper, we present an easy method for automatic 3D garment pre-positioning. Given a digital 3D mannequin and a set of 2D patterns, the problem consists in sewing automatical...